MPCVD system
Diamond growth by MPCVD
SSDR 150 is a microwave plasma-assisted CVD reactor dedicated to diamond film and gem synthesis. Being the fruitful result of thorough R&D work, this reactor uses high power density plasma to provide high purity diamond films at a high growth rate. Because of its optimized microwave and plasma design, the SSDR 150 reactor is a reliable and robust equipment, perfectly adjusted to the needs of both R&D labs and industry. Its easy to clean and change bell jar configuration makes the SSDR 150 especially suitable for doped diamond films.
Reactor characteristics
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High power density plasma
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High operating pressure up to 400 mbar or more
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6 KW 10KW 15KW micro-wave generator (switch mode power supply)
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4 gas 6 gas lines (additional lines on request)
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2-3.5 substrate holder
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Automatic height adjustment of the substrate carrier during growth (optional)
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Substrate spinning during growth (optional)
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Easy substrate loading/unloading
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Bichromatic IR pyrometer (475 – 1475 ° C)
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Turbo molecular pump + dry primary pump
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Basic reactor pressure: 2×10-7mbar
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Fully automated process
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Low maintenance
Performance of the SSDR150 reactor Polycristalline diamond
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No visible nitrogen in PL @ liquid nitrogen temperature
Monocrystalline diamond
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No nitrogen centers visible in PL @ liquid nitrogen temperature
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Low concentration of single substitutional nitrogen [NS0] (as measured by EPR)
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FWHM of the Raman diamond line at 1332 cm-1: 1.6 cm-1
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No infrared absorption from 4000 to 10000 cm-1
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Growth rate up to 10µm/h, depending on the growth conditions
Price
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SSDR150
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$520,000
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SSDR151
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$530,000
